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Toward molecular design of oxide precursors for advanced materials

Liliane G. Hubert-Pfalzgraf
IRC, Université de Lyon1 - 69626 Villeurbanne Cedex (France)

 

INTRODUCTION 

Chemical routes to materials are based on transformations in solution such as sol-gel processing, hydro or solvo thermal syntheses, Metal Organic Decomposition (MOD), or in the vapour phase chemical vapor deposition (CVD). Most chemical routes rely on the availability of appropriate “metal-organic” molecules as precursors. The most obvious precursors for oxides are molecules having already metal-oxygen bonds, namely metal alkoxides M(OR)n or oxoalkoxides MO(OR)n (R = saturated or unsaturated organic group, alkyl or aryl), b-diketonates M(b-dik)n (b-dik = RCOCHCOR') and metal carboxylates M(O2CR)n. The main advantages of sol-gel techniques for the preparation of materials are low temperature of processing, versatility, flexible rheology allowing easy shaping and embedding. They offer unique opportunities for access to organic-inorganic materials. The most commonly used precursors of oxides are alkoxides due to their commercial availability and to the high lability of the M-OR bond allowing facile tailoring in situ during processing.1,2

 

 

 

 

 

 

 

 

 

 

 

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